Substrate attachment for attaching a substrate thereto

ABSTRACT

A method for bonding a first substrate with a second substrate, characterized in that the first substrate and/or the second substrate is/are thinned before the bonding.

RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No.14/917,318, filed Mar. 8, 2016, which is a U.S. National StageApplication of PCT/EP2014/078585 filed Dec. 18, 2014, said patentapplications herein fully incorporated by reference.

FIELD OF THE INVENTION

The invention relates to a substrate attachment for attaching asubstrate thereto

BACKGROUND OF THE INVENTION

In the semiconductor industry, substrates are connected to one anotherpermanently or temporarily by so-called bonding processes.

By a bonding process, for example, substrates with different functionalunits, for example substrates with memory chips and microcontrollers,can be stacked on top of one another. A substrate stack with morecomplex properties is obtained by the stacking and permanent attachmentof multiple substrates with different properties. The thus producedsubstrate stacks have a thickness of a few hundred micrometers.

The bonding technology, however, can also be used for temporaryattachment of a substrate and/or a substrate stack. In this case, aproduct substrate is attached under pressure and/or temperature by meansof an adhesive to a carrier substrate. After the processing of theproduct substrate, the product substrate is detached again from thecarrier substrate.

The greatest problem in the state of the art consists in the alignmentand the permanent attachment of multiple extremely thin substrates. Thestacking of such thin substrates produces a substrate stack, a so-called“multi-stack.” In order to avoid the difficult and cumbersome handlingof thin substrates, the alignment and bonding process is performed onsubstrates with a defined standard thickness. After a second substrateis bonded to a first substrate, the back-thinning of the secondsubstrate is carried out. By the back-thinning process, a thin substrateis produced from a formerly thick substrate. Optionally, another, third,thick substrate, whose thickness is reduced in another back-thinningprocess, is to be bonded on this second, back-thinned substrate.Substrate stacks of any functionality can thus be produced by theprocess that theoretically can be repeated often at will.

One technical problem is that a permanent bond cannot be reversed, sothat in the case of a misalignment and/or damage, the entire substratestack constructed up to that point is unusable. A substrate stack thatis comprised of multiple substrates can be worth tens of thousands ofEuros.

SUMMARY OF THE INVENTION

This invention is based on the object of providing a method that atleast partially, preferably predominantly, solves the above-mentionedproblems. In addition, an object of this invention includes makingpossible a production of bonds that is economical and in particular asscrap-free as possible.

This object is achieved with the features of the independent claim(s).Advantageous further developments of the invention are indicated in thesubclaims. Falling within the scope of the invention are also allcombinations of at least two of the features indicated in thespecification, the claims, and/or the figures. In the indicated rangesof values, values as boundary values that lie within the above-mentionedlimits are also to be disclosed and can be claimed in any combination.

The basic idea of this invention is to back-thin at least one, andpreferably all, of the substrates to be bonded, in a departure from theprevious practice, before the, in particular permanent, bonding.

The invention thus relates in particular to a method for bonding alreadythinned substrates. In this case, the invention is preferably based onthe idea of attaching—and in this state transporting, aligning andbonding-thinned substrates, preferably wafers, to a carrier, inparticular a film, which was stretched on a frame (substrateattachment). The substrate is therefore thinned preferably to itsintended thickness during transport, and/or alignment, and/or thebonding process. In special embodiments according to the invention,thick substrates are attached to the carrier and are back-thinned onlyimmediately before the alignment (preferred) or immediately before thebonding, so that a transport of thicker substrates is also possible overa certain distance. Hereinafter, for the sake of simplicity, it isassumed that the substrates are already thinned at all times, unlessanother state is explicitly described.

In a preferred embodiment, a thinned substrate can be bonded to asubstrate that is not thinned or—even more preferably—to a substratestack. For even better avoidance of scrap-containing substrate stacks,only thinned substrates according to the invention can be bonded to oneanother.

According to an advantageous embodiment of the invention, the firstsubstrate and/or the second substrate is/are thinned to a thickness ofless than 1,000 μm, in particular less than 500 μm, preferably less than100 μm, even more preferably less than 50 μm, and most preferably lessthan 30 μm.

In further development of this invention, it is provided that the firstsubstrate and/or the second substrate for thinning and/or bonding is/areattached on a carrier surface of a carrier that has in particular aring-shaped frame. In particular, when using the same carrier forthinning and bonding, an exchange of the carrier can be eliminated, sothat the thin substrate always has a support, and thus wastage, inparticular after thinning, is prevented.

Advantageously, according to an embodiment of this invention, it isprovided that the first substrate and/or the second substrate is/arepreferably completely congruent in shape, in particular at least inrelation to a cross-sectional surface of the first substrate and/or thesecond substrate in each case parallel to a bonding surface, and/or havesimilar geometric dimensions. In particular, this invention is appliedas a wafer-to-wafer (W2W) method, leading to advantages in terms ofprocessing speed and throughput.

To the extent that the first substrate and the second substrate arealigned with one another and then are pre-attached, in particularmagnetically, before the bonding based on corresponding alignmentmarkings of the substrates, in particular with an alignment accuracy ofbetter than 100 μm, preferably better than 50 μm, even more preferablybetter than 1 μm, most preferably better than 500 nm, and all the morepreferably better than 200 nm, influences on the alignment of thecarriers on one another can be virtually eliminated.

It would also be conceivable, however, that multiple small secondsubstrates are arranged, in particular regularly, on a carrier, and inparticular were also back-thinned in order to bond simultaneously to afirst substrate. As a result, a die-to-wafer (D2W) method according tothe invention is obtained, whereby the small substrates, following thenomenclature in the semiconductor industry, are referred to as chips (ordie), although they do not necessarily have to be chips, i.e., they donot necessarily have to have an electrical functionality. The smallsubstrates are back-thinned according to the invention, in particularbefore bonding.

In a special third embodiment according to the invention, even thesimultaneous bonding of multiple small substrates to multiple smallsubstrates would be possible, which would correspond to a chip-to-chip(C2C) method. The small substrates are back-thinned according to theinvention in particular before the bonding.

Hereinafter, for the sake of simplicity, reference is to be madeexclusively to two large substrates that are in particular congruent inshape and that are handled according to the invention.

Advantageously, thinned substrates according to the invention can bebonded directly. Even more preferably, one or more of the subsequenttreatment steps is/are performed before transport and/or beforealignment and/or before bonding:

Grinding, and/or

Polishing, and/or

Etching, and/or

Separating (English: dicing)

Cleaning

Coating, in particular by

-   -   Physical methods, in particular        -   PVD    -   Chemical methods, in particular        -   CVD, PE-CVD

Functionalizing, provided in particular with electronic structures,and/or in particular

-   -   Enameling    -   Lithography    -   Embossing    -   Developing

Testing.

Only intact (i.e., tested after the above-mentioned steps) thinnedsubstrates are preferably part of a new substrate stack that is to bebonded. Thinned substrates that have defects, in particularfunctionalized, thinned substrates, in which a predominant part or evenall functional units do not function, can be removed from the processchain. As a result, the probability that the entire substrate stack isdestroyed is drastically reduced. By the process according to theinvention, the destruction of the substrate stack can be carried outhenceforth only in the alignment and/or bonding step. These two steps,however, are also used in the state of the art in order to producesubstrate stacks and therefore do not represent any additional processsteps after the bonding.

According to the invention, in particular a substrate attachment isprovided, which is thus designed to attach a thinned substrate inparticular to a carrier of the substrate attachment.

Types of Substrates

According to the invention, all standard types of substrates aresuitable, in particular wafers. The substrates can have any shape, butare preferably circular. The diameter of the substrates is in particularindustrially standardized. For wafers, the industry-standard diametersare 1 inch, 2 inches, 3 inches, 4 inches, 5 inches, 6 inches, 8 inches,12 inches and 18 inches. The method according to the invention couldalso be especially advantageous for processing rectangular substrates,in particular glass or sapphire substrates.

The substrates can be semiconductor substrates, metal substrates,ceramic substrates, mineral substrates, in particular sapphiresubstrates, glass substrates or polymer substrates. In the case ofceramic or mineral substrates, preferably sapphire substrates are used.

According to the invention, the attachment of thinned substrates or theattachment of substrate stacks, which are built up from multiple thinnedsubstrates that are already aligned with one another and bonded to oneanother, is possible. Hereinafter, therefore, substrate is alsounderstood to be a synonym for substrate stack.

Substrate Attachment

In a further development of the invention, the substrate attachmentincludes a frame and an elastic film (or tape) that is stretched overthe frame as a carrier.

The film forms in particular an adhesive substrate attaching surface, towhich the substrate can be attached. The film represents an attachingelement. The frame forms a carrier attaching surface (carrier attachingarea), which in particular acts magnetically, for attaching thesubstrate attachment to a second, in particular corresponding, substrateattachment.

In a first preferred embodiment, the substrate attachments can thereforebe attached to one another magnetically. The frame is thereforepreferably magnetic or magnetizable. The magnetic flux density of theframe is in particular greater than 10⁻⁵ T, preferably greater than 10⁻⁴T, even more preferably greater than 10⁻³ T, most preferably greaterthan 10⁻¹ T, and all the more preferably greater than 1 T.

Advantageously, the pressure that is produced on the contact surfaces ofthe substrates by two frames that adhere magnetically to one another isgreater than 10⁻⁵ N/m², preferably greater than 10⁻³ N/m², even morepreferably greater than 1 N/m², most preferably greater than 10¹ N/m²,and all the more preferably greater than 10³ N/m².

In a second embodiment according to the invention, the substrateattachments, in particular from the outer side, can be attached to oneanother via clamps.

In a third embodiment according to the invention, the substrateattachments can be attached to one another via a plug-in system. Theplug-in system is preferably expanded so that plug-in elements andrecesses, which serve to receive the plug-in elements of the oppositesubstrate attachment, alternate along a periphery in its entirety.

In a fourth embodiment according to the invention, the substrateattachments can be attached to one another electrostatically. In thiscase, corresponding plates, which can be brought to an electricalpotential, are located distributed uniformly along the substrateattachment. The plates are preferably electrically insulated by theremaining substrate attachment.

In a further development of the invention, the substrate attachment hasa solid base element with in particular controllable attaching elementsfor attaching the substrate to a flat substrate attaching surface of thebase element. In addition, the substrate attachments can be attachedbelow one another according to the above-described embodiments accordingto the invention.

In a further development, the substrate attachments can be attached toone another magnetically. The base element is therefore in particularmagnetic or magnetizable on its substrate attaching surface. Themagnetic flux density of the base element, in particular in the carrierattaching area, is in particular greater than 10⁻⁵ T, preferably greaterthan 10⁴ T, even more preferably greater than 10⁻³ T, most preferablygreater than 10⁻¹ T, and all the more preferably greater than 1 T.

Advantageously, the pressure that is produced on the contact surfaces ofthe substrates by two substrate attachments that adhere magnetically toone another is greater than 10⁻⁵ N/m², preferably greater than 10⁻³N/m², even more preferably greater than 1 N/m², most preferably greaterthan 10³ N/m², and all the more preferably greater than 10³ N/m².

The attaching, in particular magnetic, properties of the base element,frame and/or substrate attachment for adhesion between two related baseelements, frame and/or substrate attachment, in particular on thecarrier attaching surface or a carrier attaching area, are preferablyindependent of the attaching properties, mentioned below, of theattaching elements for attaching substrates.

According to a first embodiment according to the invention, theattaching element is at least an adhesive surface. The adhesive surfaceis preferably switchable electrically and/or magnetically, so that it ispossible to alternate between a state of high adhesion and a state oflow adhesion, in particular by means of a control system.

In a second embodiment according to the invention, the attachmentelement is at least one vacuum attachment to the substrate attachingsurface. The vacuum attachment preferably includes multiple vacuum feedlines, which run through the carrier surface. The vacuum feed lines arepreferably connected to a vacuum chamber located in the substrateattachment or in the carrier. The vacuum chamber can be sealed via afeed line, which can be separated from the surrounding area in afluid-dynamic manner via a valve, preferably by a control system. As aresult, it is possible according to the invention to attach inparticular a back-thinned substrate to the carrier surface by applying avacuum and to close the valve during the evacuation process. As aresult, a permanent underpressure is produced in the vacuum feed linesand the vacuum chamber. The normal pressure that acts from outside thusrepresents an overpressure relative to the underpressure area in thecarrier, and the substrate thus attaches to the carrier.

In a third embodiment according to the invention, the attaching elementis at least an electrostatic attachment. The electrostatic attachment iscomprised in particular of multiple specially formed electrodes that arealigned and oriented to one another, on which a defined potential can beset by an electric line. In the electrically conductive areas of asubstrate that is to be attached, a separation of charge, in particularan electric induction, can be produced by the generated separation ofcharge, which induction results in an electrostatic attraction betweenthe carrier on the substrate attaching surface and the substrate. Thiscan be controlled in particular by a control system.

In a fourth embodiment according to the invention, the attachmentelement is at least a magnetic attachment. The magnetic attachment ispreferably switchable and is distinguished from the in particularpermanent magnetization of the base element. The switchable magneticattachment is preferably magnetic coils, which build up a magnetic fieldby a current flux for attaching the substrate to the substrate attachingsurface. Accordingly, the substrate that is to be attached has at leastpartial magnetic properties.

In the case of a fifth embodiment according to the invention, theattaching element is at least a mechanical attachment. The mechanicalattachment is comprised in particular of clamping elements. The clampingelements attach the substrate along the substrate surface that is to bebonded. The clamping elements can remain in the attaching positionduring the alignment process according to the invention and even alsowhen the two substrates are being moved toward one another. The clampingelements can then be removed shortly before, during or even after thesubstrates make contact.

The substrate attachments thus preferably have a substrate attachingsurface and a carrier attaching surface (or carrier attaching area) thatsurrounds the substrate attaching surface.

The substrate can be back-thinned before and/or after the attaching tothe substrate attachment. If the substrate is back-thinned before theattachment to the substrate attachment, the substrate attachment is notcontaminated. However, a transfer of a back-thinned substrate to thesubstrate attachment must then be carried out. If the substrate isback-thinned after the attachment to the substrate attachment, thesubstrate attachment is preferably cleaned after the back-thinning.Because of the immediate attachment of the substrate that is to beback-thinned, however, advantages of stability will emerge. In addition,there is no need for the transferring of a back-thinned substrate to thesubstrate attachment according to the invention.

The Process

According to a first embodiment of the process according to theinvention, the two thinned substrates that are to be bonded by means ofa first attachment according to the invention are arranged at a distanceto one another, without the contact surfaces of the substrates firstmaking contact or being connected temporarily (pre-bonding). Thesubstrates are accordingly attached in each case to in particularcorresponding, opposite substrate attaching surfaces of substrateattachments.

In a first process step, an alignment of two substrates to one anotheris carried out based on alignment markings of the substrates. Despitethe alignment of the substrates, attached to the substrate attachmentsaccording to the invention, based on their alignment markings, analignment of the substrate attachments to one another according to theinvention that is not completely perfect can result if the latter arenot aligned identically with the respective substrates. The alignmentcan be carried out, for example, with one of the attachments from U.S.Pat. No. 6,214,692 B1, PCT/EP 2013/075831 or PCT/EP 2013/062473. In thecase of the alignment of multiple smaller substrates to a largesubstrate or the alignment of multiple smaller substrates to multiplesmall substrates, the alignment process can also be subject to an errorminimization process, in which the optimal alignment of the substrateattachments and thus the small substrates that are located thereon iscarried out by an error minimization. Such processes are described inthe publication WO2013/182236A1.

In particular, the further processing is carried out when an orientingangle around the normal of the two corresponding substrate attachmentsto one another is in particular less than 5°, preferably less than 1°,even more preferably less than 0.1°, most preferably less than 0.01°,and all the more preferably less than 0.0001°, and/or a translatoryshifting of the two corresponding substrate attachments to one anotheris in particular less than 5 mm, preferably less than 1 mm, even morepreferably less than 100 μm, most preferably less than 1 μm, and all themore preferably less than 100 nm. The above-mentioned values can bedetermined with a testing system.

In a second process step according to the invention, moving thesubstrate attachments according to the invention toward one another iscarried out. In the case of bringing objects together, optionally acontinuous control of the alignment markings and/or characteristicfeatures of the substrates to one another or to other features can becarried out, so that a continuous checking of the positions of thesubstrates during the bringing-together phase can take place. As aresult, it is ensured that during the bringing-together phase, noshifting of the two substrates toward one another is carried out. At theend of the process step, the surfaces of the in particular magneticsubstrate attachment, here the frame, make contact with the carrierattaching surfaces. The frames are attached to one another. Theattachment is preferably carried out via an in particular inherentmagnetization of at least one of the two frames at least on the carrierattaching surfaces. The attachment by means of an adhesive, which isapplied to at least one of the carrier attaching surfaces, is alsoconceivable, however. Another conceivable attachment option is clampingby means of clamping elements applied on the outside.

In a third process step according to the invention, a prebonding orbonding process is carried out by bringing the two substrates toward oneanother, which substrates are attached to the substrate attachingsurfaces on the carriers. The bonding process by moving the twosubstrates toward one another can also be carried out in particular bymeans for bringing objects together, in particular acentrically-oriented pressure device, in particular by a mandrel, fromthe reverse side of the substrate attachment according to the invention.Such means for bringing objects together and in particular specimenholders that were suitable for holding the substrate attachments aredescribed in more detail in the publication PCT/EP 2011/064353.

In this embodiment, the bringing-together of objects is carried out bydeformation of the carrier, in particular the film that is stretched inthe frame. The film can be deformed by a centrically-oriented pressuredevice or by a roller of the film on the side facing away from thesubstrate. In the publication WO2014037044A1, a device with a roller isdescribed, with whose help an embossing can be performed. One skilled inthe art could build an attachment from the device in the publicationWO2014037044A1, which attachment generates a corresponding line-shapedloading of the substrate attachment according to the invention, inparticular the film, and thus initiates a corresponding contactingand/or bonding process. In special embodiments according to theinvention, it may be appropriate to make one of the two substrates movetoward, by deformation of the carrier, the second substrate that is heldin an especially planar manner. Primarily a centric load is conceivablein particular using a pin for initiating a bonding wave thatautomatically propagates. This embodiment according to the invention issuitable primarily for prebonding or bonding substrates, which are to beconnected to one another by a fusion-bonding process.

In a second embodiment of the process according to the invention, thetwo substrates are attached to one another by means of the second,above-described substrate attachment.

In a first process step, an alignment of two substrates is carried outbased on their alignment markings with one another. The above remarksregarding the first embodiment of the process apply primarily for thesecond embodiment. While in the first embodiment, a shifting of thesubstrate relative to the frame that occurs after the attachment of thesubstrate can occur when the film is distorted by mechanical and/orthermal stress, this is virtually ruled out in the case of the secondembodiment.

The second process step is carried out analogously to the firstembodiment, whereby the attachment of the substrate attachmentspreferably to a carrier attaching area (instead of directly by makingcontact on a carrier attaching surface) is carried out preferablymagnetically, in particular at a distance to one another.

Should the two substrates have been pre-attached to one another by aprebonding, it can be provided according to the invention to perform anadditional full-surface bonding before and/or during a heat treatment inorder to exert an additional, in particular full-surface and uniform,pressure loading on the two substrates. The applied force is in thiscase in particular greater than 100 N, preferably greater than 1 kN,even more preferably greater than 10 kN, most preferably greater than100 kN, and all the more preferably greater than 1,000 kN. The pressuresare calculated by the division of the applied force by the surface ofthe substrate that is to be bonded. The pressure that acts on a circular200 mm substrate is therefore approximately 3.2 Pa bar at a pressureloading of 1 N and approximately 320,000 Pa at a pressure loading of 10kN.

The substrate attachments can be handled with a specimen holder and/or arobot and transported between various processes and stations.

The Heat Treatment

All embodiments of the substrate attachments according to the inventionare preferably suitable to withstand a heat treatment process, inparticular for bonding. The first embodiment, however, can be limited bya maximum operating temperature of the carrier or the substrateattachment, in particular when the carrier is a film.

The substrates can be subjected to a heat treatment in order to providea permanent connection (permanent bond). The bonding strength of thepermanent bond is in particular greater than 1.0 J/m2, preferablygreater than 1.5 J/m2, even more preferably greater than 2.0 J/m2, andmost preferably greater than or equal to 2.5 J/m2. In this case, it isadvantageous according to the invention when the substrates are locatedon the substrate attachments according to the invention. As a result, itis namely made possible to heat the substrate attachments in a massprocess (batch process). The heating is preferably carried out in acontinuous furnace. In the case of an alternative embodiment, the heattreatment is carried out in a module of a cluster that includes a numberof modules. The bonding to a hot plate is also conceivable according tothe invention. The temperature that is used in such a heat-treatmentprocess is in particular less than 700° C., preferably less than 500°C., even more preferably less than 300° C., most preferably less than100° C., and all the more preferably less than 50° C. In special cases,in which the attached substrates have specially prepared surfaces, thesubstrates can already be tightly bonded to one another when makingcontact at room temperature in such a way that an additional heattreatment is no longer necessary.

If the substrate attachments according to the invention have aferromagnetic material, the Curie temperature is preferably not exceededin order not to lose the magnetic properties of the substrate attachmentaccording to the invention.

In another embodiment according to the invention, however, specificallythe disappearance of the ferromagnetism of the substrate attachmentsaccording to the invention in the exceeding of the Curie temperature candescribe another aspect according to the invention. If the bondingstrength of the permanent bond between two substrates achieves itsmaximum only above a certain temperature, and this temperature is atleast close to the Curie temperature, an automatic separation of thesubstrate attachments by loss of ferromagnetism can be carried out byanother heating above the Curie temperature. Advantageously, thesubstrate holding devices according to the invention are then separatedbefore the temperature drops below the Curie temperature again, whichleads to a return of ferromagnetism, or at least are separated from oneanother by additional separating elements in such a way that whenfalling short of the Curie temperature, they at least are no longerconnected to one another or at least can more easily separate. Suchautomatic separating processes are advantageous primarily in fullyautomatic batch processes.

BRIEF DESCRIPTION OF THE DRAWINGS

Further advantages, features and details of the invention follow fromthe subsequent description of preferred embodiments and based on thedrawings; the latter show in diagrammatic view in each case:

FIG. 1a a diagrammatic cross-sectional depiction, not to scale, of afirst embodiment of a device according to the invention,

FIG. 1b a diagrammatic cross-sectional depiction, not to scale, of asecond embodiment of the device according to the invention,

FIG. 2a a diagrammatic cross-sectional depiction, not to scale, of afirst process step of a first embodiment of the process according to theinvention,

FIG. 2b a diagrammatic cross-sectional depiction, not to scale, of asecond process step of the first embodiment,

FIG. 2c a diagrammatic cross-sectional depiction, not to scale, of athird process step of the first embodiment,

FIG. 3a a diagrammatic cross-sectional depiction, not to scale, of afirst process step of a second embodiment of the process according tothe invention, and

FIG. 3b a diagrammatic cross-sectional depiction, not to scale, of asecond process step of the second embodiment.

In the figures, the same components or components with the same functionare identified with the same reference numbers.

DETAILED DESCRIPTION OF THE INVENTION

The first embodiment according to FIG. 1a involves a substrateattachment 1 formed from a frame 2 and a carrier 3 (here, an elasticfilm) that is stretched over the frame 2. It is also conceivable thatthe stretched carrier 3 is a very thin, but rigid plate in theunsupported state that therefore cannot be interpreted as film. Thecarrier 3 can then in particular also be elastically deformed by loadingits carrier surface 3 o. On its carrier surface 3 o, the substrateattachment 1 has a substrate attaching surface 9 (or substrate attachingarea) and in particular a ring-shaped carrier attaching surface 8 (orcarrier attaching area) that surrounds the substrate attaching surface9.

The frame 2 and the carrier 3 together form a receiving area forreceiving an in particular thinned first substrate 4, whereby a side ofthe first substrate 4 facing away from the carrier 3 is preferably setback relative to the carrier attaching surface 8.

The back-thinned first substrate 4 is attached to the substrateattaching surface 9 (here a film surface) of the carrier 3 (here, anelastic film) that is stretched over the frame 2. The carrier surface 3o is adhesive for attaching the first substrate 4 and for attaching thecarrier 3 to the frame 2.

In the embodiment according to FIG. 1b , an in particular monolithicsubstrate attachment 1′ is shown. The latter has a rigid carrier 3′ witha carrier surface 3 o′, which has a vacuum attachment as an attachingelement 5.

The attaching element 5 can have vacuum strips (as shown); instead ofthis, however, it can also have electrostatic attachments, magneticattachments, adhesive surfaces, or mechanical clamps. In particular, theattaching elements 5 also act over wide distances/long times in the caseof a transport of the carrier 3′. When using a vacuum for attaching thefirst substrate 4, the vacuum can be maintained within a vacuum chamberand/or the vacuum strips by closing a valve 6. In the case of otherattachments according to the invention, the valve 6 can be interpretedin general as a control unit that is controlled via a control system.Instead of this, a feed line for electric current would also beconceivable in the case of an electrostatic and/or magnetic attachment.

The layer thickness of the thinned first substrate 4 is small so that astabilization of the first substrate 4 by a carrier 3, 3′ according tothe invention is advantageous in order to avoid damage to the firstsubstrate 4.

What is stated above for the first substrate analogously applies for asecond substrate 4′ or other substrates if the latter are designedidentically. Combinations of the described substrate attachments 1, 1′can also be used for the second or other substrates.

In the following figures, the process according to the invention isexplained based on two examples, whereby the substrates that are to bebonded (first, second, and some other substrates) and substrateattachments are designed identically in each case. It is conceivableaccording to the invention to use different substrate attachments and/orsubstrates for the first substrate 4 and the second substrate 4′ orother substrates.

FIG. 2a shows an alignment process in which the two substrates 4, 4′ areattached in each case to carriers 3 of the substrate attachments 1 thatare arranged on opposite sides and are aligned with one another. Thealignment is preferably carried out via an alignment unit (aligner), notshown. The alignment is carried out in a way that is known in the art,preferably between corresponding alignment markings on the substratesurfaces 4 o, 4 o′ of the substrates 4, 4′.

Since the alignment is carried out on alignment markings of thesubstrates 4, 4′, the substrate attachments 1 can be shifted toward oneanother. This shifting is normally marginal and negligible, however. Inparticular, the shifting according to the invention is less than 5 mm,preferably less than 1 mm, even more preferably less than 100 μm, mostpreferably less than 10 μm, and all the more preferably less than 1 μm.In this connection, it is decisive that the corresponding carrierattaching areas or carrier attaching surfaces 8 lie opposite one anotherin such a way that an adequate transfer of force for mutual attachmentof the substrate attachments 1 is made possible.

FIG. 2b shows a contacting process, in which the surfaces 2 o (carrierattaching surfaces 8) of the two frames 2 make contact with one another.The two frames 2 are directly attached to one another in particular byinherent magnetic forces (depicted by magnetic field lines 7). It isalso conceivable that the substrate surfaces 4 o lie above the surfaces2 o. In this case, the substrate surfaces 4 o make contact before thesurfaces 2 o. The surfaces 2 o are independently drawn to one another,in particular by magnetic forces.

In the process step according to FIG. 2c , a contact between the twosubstrates 4, 4′ takes place. The making of contact can be done by anyelements that impose force on the substrates 4, 4′ in oppositedirections, in particular by centric and radially-symmetric pressureelements or by rollers. By imposing force, the elastic carrier 3 isexpanded in the direction of the opposite carrier 3. In particular, itis conceivable, as depicted, to deform both carriers 3 against oneanother. If the substrate surfaces 4 o project over the surfaces 2 o, acontact of the outer frame 2 is carried out in this process step. Inparticular in the case of the magnetic frames, the making of contact isdone independently by their magnetic attraction.

In FIG. 3a , an alignment process is shown analogously to FIG. 2a withsubstrate attachments 1′ according to FIG. 1 b.

In FIG. 3b , a contacting process is depicted, in which the substratesurfaces 4 o, 4 o′ of the two substrates 4, 4′ make contact with oneanother before the substrate attachments 1′ can come into contact. Inthis embodiment, the substrate attachments 1′ therefore operate withoutcontact. The thus formed substrate stack is attached in particular byinherent magnetic forces of the carrier 3′.

According to the invention, at least one of the two substrates 4, 4′ isa thinned substrate 4, 4′. The bonding process is thus no longer limitedto the use of thick, dimensionally-stable substrates.

LIST OF REFERENCE SYMBOLS

-   1, 1′ Substrate attachment-   2 Frame-   2 o Surface-   3, 3′ Carrier-   3 o, 3 o′ Carrier surface-   4, 4′ Substrate-   4 o, 4 o′ Substrate surface-   5 Attaching element, in particular vacuum attachment-   6 Control unit, in particular valve-   7 Magnetic field lines-   8 Carrier attaching area/carrier attaching surface-   9 Substrate attaching surface

1. A substrate attachment for fixing a substrate thereto, comprising: aplate having a surface with attaching elements integrated therein, theplate being configured to elastically deform in response to a loadapplied to the surface of the plate, the attaching elements beingconfigured to fix the substrate to the surface of the plate.
 2. Thesubstrate attachment according to claim 1, wherein the plate is rigid ina state in which the plate is not supported.
 3. The substrate attachmentaccording to claim 1, wherein the attaching elements comprise vacuumstrips.
 4. The substrate attachment according to claim 1, wherein theplate comprises a vacuum valve disposed therein, the vacuum valve beingconfigured to maintain a vacuum within the attaching elements to fix thesubstrate to the surface of the plate.
 5. The substrate attachmentaccording to claim 1, further comprising: a control unit configured tocontrol the attaching elements to fix the substrate to the surface ofthe plate.
 6. The substrate attachment according to claim 5, wherein thecontrol unit comprises a valve configured to maintain a vacuum withinthe attaching elements to fix the substrate to the surface of the plate.7. The substrate attachment according to claim 5, wherein the controlunit comprises a feed line for electric current to control the attachingelements to fix the substrate to the surface of the plate.
 8. Thesubstrate attachment according to claim 7, wherein the attachingelements are electrostatic elements, and wherein the feed line forelectric current is configured to control the electrostatic elements tofix the substrate to the surface of the plate.
 9. The substrateattachment according to claim 7, wherein the attaching elements aremagnetic elements, and wherein the feed line for electric current isconfigured to control the magnetic elements to fix the substrate to thesurface of the plate.